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UK-based Surface Technology Systems plc (STS) has received an order for its VPX Pegasus Deep Reactive Ion Etch (DRIE) system from austriamicrosystems, headquartered in Unterpremstaetten, Austria.
The system purchased by austriamicrosystems combines a DRIE processing capability, offering the highest silicon etch rate currently on the market and exceptional plasma uniformity, say STS. It has a Brooks cluster core that can accommodate up to three process chambers.Visit: http://www.stsystems.com