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6 June 2006
Rudolph launches new metrology systems
Rudolph Technologies Inc has introduced its S3000 and S2000 ellipsometry-based metrology systems, for 300mm and 200mm advanced chip manufacturing, respectively.
Using Rudolph's fifth-generation focus-beam ellipsometry, the systems provide ellipsometry for transparent film metrology applications in the thin film, CMP, etch and lithography modules. Both systems also have optional deep UV and visible reflectometry capabilities.Visit: http://www.rudolphtech.com
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