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MBE Komponenten, of Weil der Stadt, Germany now offers its new Oxygen Atom Beam Source (OBS), an oxygen resistant thermal gas cracker for various UHV, MBE, and ALD applications.
The company, a manufacturer of ultra high vacuum (UHV) and molecular beam epitaxy (MBE) components and systems, says the OBS produces an ion-free oxygen gas beam. It has been developed and characterized in collaboration with Dr K.G. Tschersich at the Institute of Bio- and Nanosystems Research Centre, Jülich.
Based on thermal dissociation within a DC-heated cracking tube, the OBS provides a narrow angle distributed atomic oxygen beam. According to the company, efficient cracking of O2 molecules with a degree of dissociation of more than 80% is achievable depending on operating conditions, and therefore the O2 background pressure in the chamber is very low compared to other sources.
The OBS can obtain a high oxygen flux of up to 1016 atoms/s. Compact design and ease of installation, say the company, makes the OBS an ideal source for many applications which need atomic oxygen.
Visit: http://www.mbe-components.com
Contact Frank Huber: info@mbe-komponenten.de