Veeco presenting at ALD/ALE 2019 conference

Epitaxial deposition and process equipment maker Veeco Instruments Inc of Plainview, NY, USA says that its technologists are presenting three papers and posters at the AVS 19th International Conference on Atomic Layer Deposition (ALD 2019) in Bellevue, WA, USA (21-24 July).

The conference, which coincides with the sixth annual International Atomic Layer Etching Workshop (ALE 2019), is dedicated to the science and technology of atomic layer controlled deposition of thin films and new topics related to atomic layer etching.

Veeco’s industry experts are presenting on a wide range of topics. Specifically, this includes VP of applied technology Ganesh Sundaram, in collaboration with North Carolina State University (NCSU), presenting in the session ‘High Performance ALD of Gate Dielectrics for 4H-SiC Power Device Application’ (AA2-TuP08) on 23 July (5:30-7:30pm PT) in the Evergreen Ballroom and Foyer

Also at ALD 2019, Veeco is exhibiting in booths 301-303.

Tags: Veeco ALD

Visit: www.ald2019.avs.org

Visit: www.veeco.com