Brooks Instrument highlighting new pressure-based MFC at CSTIC and SEMICON China

Brooks Instrument of Hatfield, PA, USA, a provider of flow, pressure, vacuum and vapor delivery solutions, is showcasing its new GP200 Series pressure-based mass flow controller (P-MFC) at the China Semiconductor Technology International Conference (CSTIC 2019) in Shanghai (18-19 March) in conjunction with SEMICON China 2019 (20-22 March), where it is co-exhibiting in booth N33675 with its regional business partner SCH Electronics Co Ltd.

During the conference, chief technology officer Mohamed Saleem is discussing the GP200 P-MFC’s design, operation and capabilities in a presentation ‘A New Differential Pressure Sensor-based Mass Flow Controller for Advanced Semiconductor Processing’.

Designed with exclusive alarm capabilities for early detection of potential process issues, the GP200 P-MFC enables precise and repeatable control for critical gas delivery applications and is fully pressure insensitive to dynamic inlet and outlet pressure conditions. Process gas accuracy is +/-1% and repeatability is +/-0.15% of set point.

Brooks Instrument developed the GP200 P-MFC based on a combination of absolute and differential pressure transducers, where a single differential pressure sensor is used instead of two absolute pressure sensors to compute pressure drop. “The advantage of this technique is that it eliminates the need for having matched absolute sensors, and therefore prevents uncontrolled drifts and flow inaccuracies, which yields superior accuracy and repeatability of flow measurement,” says Saleem.

Tags: Mass flow controllers

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