30 March 2018

Lund University chooses Eulitha PhableR 100 DUV nano-lithography system for developing nanowire devices

© Semiconductor Today Magazine / Juno PublishiPicture: Disco’s DAL7440 KABRA laser saw.

Eulitha AG of Kirchdorf, Switzerland (a spin-off of the Paul Scherrer Institute in Villigen that offers lithographic equipment and services for nanotechnology, photonics and optoelectronic applications) has received an order for a PhableR 100 DUV photolithography systems from Sweden’s Lund University, a leader in the materials science and applications of nano-structured semiconductors.

The PhableR 100 DUV exposure tool incorporates Eulitha’s proprietary Displacement Talbot Lithography technology that enables robust printing of very high-resolution periodic patterns at low cost. The system ordered by Lund operates with a 193nm ArF excimer laser that enables printing of features much smaller than 100nm.

The new tool will be installed at the Lund Nano Lab (LNL) nanofabrication facility, which is operated by NanoLund, the Center for Nanoscience at Lund University. LNL has more than 80 installed processing tools, including epitaxial systems, patterning tools and characterization equipment, serving more than 150 users from academic research groups and industry.

“We are grateful to both the university’s Faculty of Engineering (LTH) and NanoLund for granting us the funding to purchase the PhableR 100 DUV system,” says Lund Nano Lab’s operations manager Dr Maria Huffman. “Also, we are very pleased that the technical leadership of Hexagem AB shared with us their data on gallium nitride (GaN) nanowires grown on substrates patterned on the Eulitha tool, which enabled us to evaluate the tool in a very efficient and effective manner,” she adds. “This Displacement Talbot Lithography system will be useful to a variety of research projects and applications within the NanoLund research community. It will not only provide added capabilities currently lacking at the LNL but will also be a unique tool within Sweden… Such a capability will attract various researchers, both locally and nationally.”

The PhableR 100 DUV system can expose periodic patterns with feature sizes well below 100nm, rivaling the performance of much more expensive state-of-the-art steppers, claims Eulitha. “This equipment will let us address the feature size range of 90-100nm, which makes it very attractive to all nanowire growers within the research community, in particular those working on LED and solar cell development,” says Huffman.

“One key advantage is the fact that this is a non-contact technique, perfectly suitable for sensitive substrates,” she adds. Patented focus-free imaging enables uniform printing on non-flat substrates often employed in photonic and optoelectronic sectors.

Eulitha has previously announced the delivery of lithography systems to the University of Bath in the UK and Waterford Institute in Ireland.

See related items:

University of Bath installs Eulitha's Phable lithography system to develop nano-engineered semiconductor manufacturing techniques

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