- News
3 August 2016
Plasma-Therm receives orders for etch and deposition systems from imec
Plasma process equipment maker Plasma-Therm LLC of St Petersburg, FL, USA has received orders from imec of Leuven, Belgium for two Advanced Vacuum Apex SLR plasma processing systems that will provide etch and deposition capabilities to be used in nanoelectronics R&D.
One system will be configured with an inductively coupled plasma (ICP) source. The other system will be configured configured for high-density plasma chemical vapor deposition (HDP-CVD). Apex SLR systems incorporate a field-proven, high-density plasma source that was developed by Advanced Vacuum's parent company Plasma-Therm for its widely used Shuttlelock line of plasma tools.
"Plasma-Therm has a long history supporting R&D institutions, and this order continues that tradition," says Dr David Lishan, Plasma-Therm's director, technical marketing. "Leading R&D organizations rely on Plasma-Therm technology for developing new processes and creating smaller, faster, and more efficient devices," he adds.
"These Apex SLR systems were selected by imec's scientists to help develop industry-relevant technology solutions," Lishan continues. Recent imec innovations include disposable photonics biosensors, flexible electronics, hyperspectral imaging devices, and 3D device integration (advanced packaging) processes.
Advanced Vacuum's Apex SLR is a highly versatile, small-footprint plasma processing system. Apex SLR ICP is capable of etching a wide range of materials used in semiconductor devices and nanotechnology, while the Apex SLR HDP-CVD enables relatively low-temperature plasma deposition of high-quality thin films. These films can include optical coatings, semiconductor device passivation layers, and other materials used in nanoelectronic fabrication and other applications with limited processing thermal budget.
Advanced Vacuum APEX SLR system expanding device processing at NASA's JPL
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