22 October 2015

Taiwan's LandMark Optoelectronics orders another Aixtron MOCVD system to expand laser epi capacity

Deposition equipment maker Aixtron SE of Herzogenrath, near Aachen, Germany says that Taiwan's LandMark Optoelectronics Corp, which supplies gallium arsenide (GaAs) and indium phosphide (InP) based epitaxial wafers for optical communications, industrial applications and special-purpose usage, has placed a repeat order for another AIX 2800G4-TM metal-organic chemical vapor deposition (MOCVD) system (to be delivered in first-quarter 2016) for the production of laser diode devices.

Based on Aixtron's production-proven Planetary Reactor platform and particularly suitable for the production of high-performance laser diodes, the AIX 2800G4-TM system is complemented by a highly efficient Transfer Module (TM) that enables higher throughput and reduced cycle times. In addition, the equipment design allows flexible configuration of wafers from 2-inches to 8-inches to address customer's products evolution over time while at the same time minimizing the cost per wafer.

"We will provide full support to LandMark to enable our customer to start up production with the new tool as quickly as possible," says Aixtron's executive VP & chief operating officer Dr Bernd Schulte.

See: Aixtron Company Profile

Tags: Aixtron MOCVD

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