1 July 2015

Fraunhofer Institute for Photonic Microsystems installs OIPT FlexAL ALD system

The Fraunhofer Institute for Photonic Microsystems (FhG IPMS) in Dresden, Germany has installed a FlexAL system for plasma-enhanced atomic-layer deposition (PEALD) and thermal ALD from UK-based Oxford Instruments Plasma Technology (OIPT) in its Center for Nanoelectronic Technologies (CNT).

The fields of use for the new tool include R&D on processes for metal oxides for ultra-thin integrated 3D capacitors, the development of new and unique metal ALD processes, and as a platform with a combinatorial screening concept (including in-situ metrology and standardized tests) for ALD/PEALD precursor development serving gas and chemical supplying companies. The FlexAL will also serve as a 200mm PEALD tool for the micro-opto-electro-mechanical systems (MOEMS) pilot line at Fraunhofer IPMS.

"The Center for Nanoelectronic Technologies has long-term experience in atomic layer deposition," comments Dr Romy Liske, business unit manager of FhG IPMS-CNT. "ALD is the process of choice whenever precise thickness and composition control of thin films in the nanometer range are required," he adds. "This is particularly the case for semiconductor devices where the smallest dimensions of some tens of nanometer are fabricated, and an increasing demand is observed for high-conformal thin ALD films. Consequently, the development of materials and compounds deposited by ALD is increasing."  

After a rigid tendering process, the FlexAL PEALD system was chosen because of its capabilities as a high-end ALD research and development tool, says Oxford Instruments. The broad range of processes enabled by the FlexAL's design allows the combination of plasma and thermal processes in one fully automated recipe, while the flexible precursor cabinet enables effective combinatorial precursor screening with in-situ metrology.

"The proven performance and versatility of the Oxford Instruments FlexAL together with the availability of multiple room-temperature variants of PEALD processes made it the 'system of choice' for the Center for Nanoelectronic Technologies," says OIPT's sales, service & marketing director Dr David Haynes. 

Tags: OIPT ALD

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