13 August 2014

USTC orders additional OIPT plasma etching system

UK-based etch and deposition equipment maker Oxford Instruments says that an additional PlasmaPro 100 plasma etch system has recently been ordered by the Center for Micro and Nanoscale Research and Fabrication at the University of Science and Technology of China (USTC) Hefei city, Anhui Province, adding to their existing installed base of Oxford Instruments etch and deposition systems.

The systems are installed in USTC’s newly opened cleanroom and will be used for fundamental research into the increasingly important field of quantum information processing. Multiple Oxford Instruments plasma systems, including a PlasmaPro 100 ICP380 and PlasmaPro NGP 80 RIE and PlasmaPro 100 PECVD deposition tools, were already installed in USTC’s new facility during the past year.

“We chose Oxford Instruments systems as we have found that they offer extensive process capabilities, and great flexibility, backed by excellent support and service packages,” comments USTC’s professor Zhu. “These tools will allow our researchers to push the limits in micro- and nanoscale fundamental research,” he adds. “USTC has a very strong background in both nanoscale science and engineering, and this new state-of-the-art nanofabrication facility aims to drive collaborative, interdisciplinary, and fundamental research in the micro- and nano-scale.”

Quantum information processing will be one of the leading topics at Oxford Instruments’ Nanotechnology Tools two-day workshop in Beijing, 24-25 September.

See related items:

Oxford Instruments' Nanotechnology Seminar at China's Institute of Semiconductors to start with 2D materials sessions

Tags: OIPT Etch

Visit: www.oxford-instruments.com/BTNT-Beijing