12 June 2013

Brooks adds four new MFCs and a technology development center for semiconductor processing applications

Brooks Instrument LLC of Hatfield, PA, USA, a provider of flow, pressure, vacuum, level and vapor delivery solutions, says it has expanded its commitment to the semiconductor industry with the introduction of four products and a new technology development center in Irvine, CA, USA.

The new products include the GF135 diagnostic mass flow controller (MFC) and three MFCs (the GF101, GF121 and GF126) for high-flow applications. The MFCs, which expand Brooks’ GF100 Series product line for semiconductor processing applications, are all built on a common platform and interface, enabling an entire system to use one product platform.

“Our strategic focus for the technology center will be to strengthen our relationships with semiconductor end-users and equipment manufacturers so we can translate customer needs into product requirements,” says chief technology officer Bill Valentine.

The GF135 is claimed to be the first ‘smart’ pressure transient insensitive (PTI) MFC that can perform self-diagnostics – including integral rate-of-decay flow measurement – without stopping the flow of process gas. The firm says that semiconductor makers can now verify accuracy, check valve leak-by, and monitor sensor drift in real time without removing the flow controller from the gas line. The new diagnostic technology allows uninterrupted production of wafers and hence potentially daily cost savings.  

The GF101, GF121 and GF126 are high-flow thermal MFCs that suit LED and semiconductor process and purge applications requiring ultra-high purity and flow rates up to 300slpm, says Brooks. As well as delivering good accuracy, response time and reliability, the MFCs have a small footprint, adds the firm.

The new products are being showcased in booth 1347 (South Hall) at the SEMICON West trade show in San Francisco (9-11 July).

Tags: Brooks Mass flow controller

Visit: www.BrooksInstrument.com