2 January 2013

Oxford Instruments reports successful Nanoscale Plasma Processing workshop at MTL

UK-based Oxford Instruments Plasma Technology (OIPT) reports that its first workshop held at MIT’s Microsystems Technology Laboratories (MTL), Cambridge, MA in December was well attended. The workshop addressed the latest research and technologies in plasma etch and deposition, via technical presentations and discussions.

“This was an excellent workshop, and the talks presented a huge amount of very useful information, allowing our students and researchers to learn more about Atomic Layer Deposition and plasma processing from the experts, while also attracting participants from the wider technical community. Many of the attendees have reached out to tell me how much they learnt about the processes discussed. I think this is a really good way for Oxford Instruments to highlight the expertise of its staff,” said Dr. Vicky Diadiuk, associate director, Operations, MTL.

Presentation topics included: Atomic Layer Deposition (ALD) process and applications; an overview of plasma etch, PECVD & TEOS processes, as well as MEMS & nanoscale applications.

Tags: OIPT Plasma etch ALD PECVD

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