27 September 2012

Oxford Instruments to hold scientific workshop at IISc Bangalore

UK-based Oxford Instruments and IISc Bangalore are holding a 2 day seminar (20-21 November 2012) covering nanoscale processing, materials characterisation, surface science and cryogenic environments.

Guest speakers from research institutions, including the Lawrence Berkeley National Laboratory, California, USA; and Glasgow University, UK; distinguished speakers from Indian research institutes and IISc Bangalore, and technical experts from Oxford Instruments will all participate. Aimil Ltd and Mack International, Oxford Instruments’ agents, will be supporting the event.

Two parallel sessions will focus on Oxford Instruments’ key areas of expertise: ‘Thin film processing’, and ‘Materials characterisation, surface science and cryogenic environments’. The programme also includes time for all participants to network, and a networking social event on Tuesday evening (20 November).

‘Thin film processing’ workshop presentation topics include:

• Deep silicon etch - MEMS, ALD and silicon
• III-V
• Deposition for compound semiconductor processing
• Plasma modelling and validation - ion densities, minimum ion energies
• ICT etch
• Nanotechnology
• Different frequencies in plasma processing
• Plasma processing hints and tips
• Molecular beam epitaxy

‘Materials characterisation, surface science and cryogenic environments’ presentation topics include:

• Cryogenic environments and applications: Ultra-Low-Temperature (< 1 Kelvin) ,superconducting magnets, software and measurement system capability
• Using Nano-manipulators for surface characterisation and TEM sample preparation; including live demonstrations and hands on training.
• Characterisation techniques such as EDS, thin film analysis using EDS including thin film ID technique details and demonstration
• Ultra-High-Vacuum scanning probe microscopy
• Electron spectroscopy for chemical analysis
• Photoemission on heterogeneous Graphene

Tours of the Nanofabrication Cleanroom will be available during the afternoon of 20 November. Please book.

“Oxford Instruments is delighted that the company is holding this first Seminar in India in conjunction with such a prestigious host university. As a Group, Oxford Instruments strives to meet its customers’ needs through advanced technology and service, using innovation to turn smart science into world class products. This event will showcase our extensive capabilities to Indian scientists, while bringing together speakers and users who are at the forefront of their field,” said chief executive, Jonathan Flint. “India has an increasingly significant role in global scientific research and development and we have the tools and expertise to support this growth”.

This seminar is free of charge, but must be booked in advance as places are limited. To book a place or receive further information, email: ‘Thin film processing’ plasma-email@oxinst.com and ‘Materials characterisation, surface science and cryogenic environments’ nanoscience@oxinst.com

Tags: Oxford Instruments Thin film processing Materials characterisation

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