- News
31 May 2012
Jenoptik expands high-power laser production with new Aixtron AIX 2600G3 IC MOCVD system
Deposition equipment maker Aixtron SE of Herzogenrath, Germany says that in fourth-quarter 2011 it received an order for an AIX 2600G3 IC MOCVD reactor in 12x4”-wafer configuration from existing customer Jenoptik Diode Lab GmbH, which conducts semiconductor fabrication at its Adlershof campus in Berlin, Germany.
For delivery in second-half 2012, the new system will form the basis of a new capacity expansion for high-power semiconductor laser diode epitaxial materials at Jenoptik’s Lasers & Material Processing Division. The Aixtron Europe support team will install and commission the new reactor in Jenoptik’s new dedicated production facility in Berlin-Adlershof.
“Due to increasing demand as a result of high levels of customer satisfaction, particularly from Asia, it is likely that our existing production facility in Berlin will soon reach the limits of its capacity, and it is therefore being expanded,” says a spokesman from Jenoptik Diode Lab. “As the new facility will more than double our production capacities, we need to introduce more MOCVD capability,” they add. “Aixtron equipment has served us very well, and we now wish to bring in the AIX 2600G3 IC MOCVD reactor in order to better respond to high levels of customer satisfaction and demand.”
From its own production facility in Berlin-Adlershof, which has been operating since 2006, Jenoptik has developed optoelectronic base materials in cooperation with the nearby Ferdinand-Braun-Institut, Leibniz-Institut for Ultra High Frequency Technology (FBH). Laser bars from Berlin-Adlershof are processed to create high-power diode lasers at Jenoptik in Jena as part of a complete technology chain through to laser systems for material processing. Jenoptik says that the new manufacturing facility will be automated and equipped with state-of-the-art production technology.
Aixtron Jenoptik MOCVD Laser diodes
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