10 July 2012

TRUMPF selects Aixtron AIX 2800G4-TM system for As/P-based high-power laser production

Deposition equipment maker Aixtron SE of Herzogenrath, Germany says that TRUMPF Photonics Inc of Princeton, NJ, USA has taken delivery of an AIX 2800G4-TM metal-organic chemical vapor deposition (MOCVD) reactor for high-power laser applications.

“TRUMPF Photonics has been delivering high-quality laser components to the high-power laser industry for over 10 years. The recent increase in market demand has required us to upgrade our manufacturing capabilities,” says Dr Carl Miester, head of production semiconductors at TRUMPF Photonics. “We have performed an exhaustive search of the current MOCVD technologies. The enhancements Aixtron has made in the control of the MOCVD process has made it the ideal platform for the challenging structures required for the high-power laser market,” he adds.

“Aixtron has maintained its investment in the development of MOCVD technology for all compound semiconductor material systems such as As/P materials for the solid-state laser markets,” says Aixtron’s chief operating officer Dr Bernd Schulte. “TRUMPF’s decision to continue to use our platform provides confirmation that these investments have been successful.”

TRUMPF Photonics Inc was formerly part of Princeton Lightwave Inc, before acquisition by industrial laser manufacturing subsidiary TRUMPF Inc of Farmington, CT. The TRUMPF Group has 58 subsidiaries and branch offices in more than 26 countries, employs over 8500 people, and generates sales exceeding $2.76bn.

See: Aixtron Company Profile

Tags: Aixtron MOCVD TRUMPF As/P High-power laser

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