- News
16 January 2012
China’s Wuhan National Laboratory for Optoelectronics signs off Vistec e-beam litho system
Vistec Lithography B.V. of Best, The Netherlands says that its EBPG5000pES electron-beam lithography system has been signed off by Wuhan National Laboratory for Optoelectronics (WNLO) at the Huazhong University of Science and Technology (HUST), a national key university in Wuhan, China. The development represents a “major milestone” in the strategic partnership between the three organizations, says Vistec.
Co-established by the Ministry of Education, Hubei Provincial Government and Wuhan Municipal Government, WNLO is one of China’s first five national laboratories. It is managed by HUST and in collaboration with Wuhan Research Institute of Posts and Telecommunications (WRI), Wuhan Institute of Physics and Mathematics (WIPM) affiliated to the Chinese Academy of Sciences (CAS), and Huazhong Institute of Optoelectronic Technology (HIOT).
The EBPG5000pES e-beam lithography system should enable WNLO to further strengthen its position in photonics and optoelectronics R&D. "The EBPG5000pES facilitates us to achieve all the lithography challenges we are facing in our research,” says professor Jinsong Xia, director of the Optoelectronic Micro & Nano Fabrication and Characterization Facility (OMFC) at WNLO. “In respect to application support and service we know that we can count on the Vistec team as our strategic partner,” he adds.
The EBPG5000pES is a high-end lithography tool based on a proven system architecture. With its flexible electron-optical column and high-brightness TFE (thermal field emission) source, allowing 50 and 100kV operation, the system provides a spot size down to <2.2nm, enabling nano-lithography structures smaller than 8nm to be generated routinely. The system incorporates an interactive graphical user interface (GUI) that provides ease of use for diverse, multi-user, university-type environments, says Vistec.
“The electron-beam lithography system at WNLO is the first operational Vistec EBPG5000pES in the People’s Reuplic of China, which opens up great opportunities to a sustainable business development for Vistec in that region,” says says Vistec Lithography’s managing director Erwin Mueller.
Vistec Electron-beam lithography
©2006-2016
Juno Publishing and Media Solutions Ltd. All rights reserved. Semiconductor
Today and the editorial material contained within it and related media is
the copyright of Juno Publishing and Media Solutions Ltd. Reproduction in
whole or part without permission from Juno Publishing and Media Solutions
Ltd is forbidden. In most cases, permission will be granted, if the magazine
and publisher are acknowledged.