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1 August 2012

Rubicon patent allowed for in-situ crystal orientation

Rubicon Technology Inc of Bensenville, IL, USA, which makes monocrystalline sapphire substrates and products for the LED, RFIC, semiconductor and optical industries, says that the US Patent and Trademark Office (USPTO) has allowed Rubicon’s patent application ‘Intelligent Machines and Process for Production of Monocrystalline Products with Goniometer Continual Feedback’. The patent covers Rubicon’s equipment and process developed to perform in-situ orientation of its sapphire crystals within the various fabrication tools used by the firm.

Rubicon says that its customers in the LED, silicon-on-sapphire (SoS)/RFIC (radio-frequency integrated circuit) and optical markets all have specific and distinct requirements for the crystal planar orientation of the sapphire products used in their applications. The new patented orientation technology provides greater precision in sapphire planar orientation and eliminates time-consuming steps by performing the orientation at the fabrication tool. The resulting efficiencies will ultimately translate into savings for customers, reckons Rubicon.

“Rubicon is known by many for its expertise in crystal growth technology, but our technological leadership extends from raw material through finished sapphire wafers,” says president & CEO Raja M. Parvez. “This patent reflects one of many technological innovations we’ve put in place to meet our customers’ exacting and evolving requirements.”

Tags: Rubicon Sapphire substrates

Visit: www.rubicon-es2.com


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