24 April 2012

Changchun University of Science and Technology orders Aixtron reactor for laser development

Deposition equipment maker Aixtron SE of Herzogenrath, Germany says that in fourth-quarter 2011 it received an order from new customer Changchun University of Science and Technology (CUST) for a multi-wafer metal-organic chemical vapor deposition (MOCVD) system that will be dedicated to the growth of quaternary materials for laser diodes.

Following delivery in third-quarter 2012, Aixtron's local support team will install and commission the new reactor in CUST's facility in Changchun, Jilin province, China.

“Aixtron MOCVD systems have a very high reputation worldwide for the development and production of compound semiconductor materials,” comments Dr Liu, director of epitaxy facilities at CUST. “We received excellent reports of these capabilities from our colleagues at the Changchun Institute of Optics, Fine Mechanics and Physics (CIOMP) at the Chinese Academy of Sciences (CAS), who have successfully demonstrated a similar application using Aixtron equipment.,” he adds.

The CUST team will use the new reactor for the development of InGaAlAs and InGaAsP materials, which will form a process technology foundation for the fabrication of advanced lasers. “Aixtron technology also comes with a responsive local service team, and this will help to ensure smooth and efficient progress when we begin materials development using the new system,” says Liu.

Founded in 1958 by the Chinese Academy of Sciences, CUST has evolved into a multidisciplinary university with optoelectronics technology as its highlight, along with the integration of optics, mechanics, electronics, computer science and material science. 

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