16 November 2011

Oxford Instruments releases white paper on ion beam etching

UK-based etch, deposition and growth system maker Oxford Instruments Plasma Technology (OIPT) says that its latest technical White Paper (on ion beam etching) is now available.

Authored by senior ion beam application and technology specialists Dr Sebastien Pochon and Dr Dave Pearson, the white paper presents a review of ion beam etch technology, and considers the main applications and advantages of using the technology for etching processes when compared to technology such as plasma etching. An overview of how an ion beam is generated is first described, followed by a presentation and discussion of the process applications of ion beam technology.

“In order to offer the very best in ion beam and plasma systems, our experienced teams of applications engineers and technologists continue to develop and research into their areas of expertise, and as a result we offer our customers many technical papers, such as this White Paper, in addition to a process library of over 6000 recipes,” says Applications Team Manager Robert Gunn.

Oxford Instruments’ range of ion beam tools includes the Ionfab300Plus (offering the flexibility to perform etch and/or deposition while maximizing system utilization), the Ionfab500Plus (designed for ultra-high-quality optical thin films), and the Optofab3000 (developed specifically for high-quality optical applications).

The white paper is available by e-mailing process.news@oxinst.com

Tags: OIPT Ion beam etching

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