29 November 2011

WIN adds Aixtron MOCVD reactors to boost GaAs IC production

Deposition equipment maker Aixtron SE of Herzogenrath, Germany says that WIN Semiconductors Corp (the world’s largest pure-play gallium arsenide foundry), an existing customer and a leading manufacturer of microwave devices in Taiwan, has ordered two MOCVD systems: another AIX 2600G3 system in 7x6-inch wafer configuration as well as its first AIX 2800G4 system in 8x6-inch wafer configuration.

WIN is a designer, developer, manufacturer and vendor of GaAs microwave integrated circuits and became one of the first Taiwanese companies to recognize the opportunities in the market for terrestrial compound semiconductor solar cells. In 2007, it installed a dedicated Aixtron AIX 2600G3 IC epitaxy reactor as the foundation for its diversification into solar cell manufacturing.

The new reactors will be delivered in fourth-quarter 2011 then installed and commissioned by a local Aixtron service support team at WIN’s facility in Kuei Shan Hsiang, Taiwan. WIN will use the systems to develop and mass produce various high-performance devices.

“This is the first Aixtron G4 MOCVD system for us so it is especially important for our further business development,” says WIN. “In order to expand our production throughput we have decided that, based on very good reactor experience and with an eye on the future, we would not only acquire another G3 but also our first G4,” the firm adds. “As well as bigger wafer capacity, this will give us top performance across all the parameters, coupled with features we are familiar with such as ergonomics, versatility plus seamless process compatibility with our existing reactors... Aixtron equipment also comes with guarantees and full back up thanks to their responsive and knowledgeable service staff.”

See: Aixtron Company Profile

Tags: Aixtron MOCVD GaAs GaAs ICs WIN Semiconductors

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