5 January 2011

Invenlux orders JVS’ QC3 HRXRD tool for LED epi production

X-ray and vacuum ultraviolet (VUV) metrology tool maker Jordan Valley Semiconductors Ltd (JVS) of Migdal Haemek Israel has received an order from Invenlux Optoelectronics (China) Co Ltd of Haiyan, Zhejiang for its QC3 HRXRD high-resolution x-ray diffraction tool, a high-throughput, multiple-wafer-size diffractometer, used for the quality control of epitaxial layers in the LED production line.

“Jordan Valley’s XRD system will have a key role at our new production line of GaN (blue, green and purple) epi-wafers, for which InvenLux has their own patent,” says InvenLux Optoelectronics’ CEO Dr Chris Yan. “We have selected JVS systems to meet our customers’ significant extension in demand, which appears about to gather yet more momentum,” he adds. “Having JVS as our supplier gives us confidence that we will increase our capacity and gain operational efficiency and consistency.”

InvenLux Optoelectronics (China) was founded in May 2009 and is the LED product manufacturing facility for US-based InvenLux Corp of El Monte, CA, USA. The firm spans the complete LED manufacturing chain, including MOCVD growth, LED device design and processing, material and device characterization, and LED packaging & testing for volume LED production and advanced R&D.

“The QC3 diffractometer was designed for high throughput and low cost of operation, assuring outstanding cost/performance value,” says JVS’ director of sales & marketing Alon Kapel. “With RSM [reciprocal space mapping] scans performed in just a few minutes, a multiple wafer stage (2–6”) and best analysis software (JV RADS), the QC3 system is optimized for LED mass production quality control,” he adds. Since the QC3’s launch in January 2010, many tools have already been installed and are running in production lines across China, Taiwan and other LED manufacturing sites worldwide, Kapel notes.

The QC3 production metrology tool was designed for the characterization of all common semiconductor materials, including GaAs, InP, Si and GaN (thick buffers) for high-brightness LED (HB-LED) manufacturing. The system also suits the analysis of multilayer structures such as HEMTs and HBT, due to its capability to determine the thickness and composition of all layers within a stack, especially graded composition layers within HBT structures (determined from first principles using the firm’s RADS HRXRD simulation software). The tool suits the measurement of MQW (multi-quantum well) thickness, indium composition, tilt and twist, and its high intensity gives higher precision for better throughput, it is claimed.

Tags: Jordan Valley InvenLux Epitaxy LEDs Metrology

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