22 February 2011

Taiwan LED chip maker Ubilux boosts capacity with Aixtron CRIUS II systems

Deposition equipment maker Aixtron SE of Herzogenrath, Germany says that in fourth-quarter 2010 it received an order from existing customer Ubilux of Southern Taiwan Science Park, Tainan County for two CRIUS II metal-organic chemical vapor deposition (MOCVD) reactors in 55x2-inch wafer configuration, to expand production capacity for gallium nitride (GaN)-based high-brightness (HB) LEDs. The systems will be delivered in first-quarter 2011 and commissioned by the local Aixtron support team.

“Ubilux already has several CRIUS systems for GaN applications as well as a G3 system for GaAsInP application,” says Ubilux’s president Dr Henry Chen. “We are impressed with these systems’ good performance,” he adds. “Over the years, we have built up an excellent relationship with the company so we were very interested in acquiring the newest-generation systems for our further expansion plans... This is our first CRIUS II system purchase order,” continues Chen. “Once we had finalized our expansion plans, we approached Aixtron's local representatives.”

“A notable feature of the Taiwan MOCVD community is the high number of the most advanced technology Aixtron systems that are being used for the mass production of UHB-LEDs,” says Aixtron Taiwan’s general manager Christian Geng. “Our support and field service is available 24 hours a day, 365 days a year to guarantee customers receive the support they need by phone or on-site,” he notes. “Last year the Aixtron Taiwanese support team handled over 1800 installations, upgrades, and customer support requests.”

See: Aixtron Company Profile

Tags: Aixtron MOCVD GaN LEDs Ubilux CRIUS II

Visit: www.ubilux.com.tw

Visit: www.aixtron.com

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