26 August 2011

OIPT details ‘Nanoscale Plasma Processing’ workshop for Grenoble 

UK-based etch, deposition and growth equipment maker Oxford Instruments Plasma Technology (OIPT) is continuing its series of workshops with a one-day ‘Nanoscale Plasma Processing’ event at the French research center CEA-LETI in Grenoble, France on 18 October. The workshop will be particularly relevant to those working in industry and academia with an interest in R&D advances, plus future trends in the fabrication and application of micro- and nano-structures and devices.

The workshop will consist of presentations, discussions and a networking lunch, focussing on the latest innovations in MEMS Etch developments, Ion Beam Etch and Deposition, Atomic Layer Deposition (ALD), Silicon and III-V Etch for nanowire applications.

Invited guest speakers from key research institutes will discuss their research, including professor Daniel Alquier (director, LMP in Tours, France); a speaker from IEMN (Lille, France); and Dr Alex Robinson (University of Birmingham, UK). In addition, experts in their field from Oxford Instruments will speak on the latest process and application developments in a number of plasma processing areas.

“We’ve been hosting these successful seminars worldwide for several years, most recently at IOS-CAS (Institute of Semiconductors, Chinese Academy of Sciences), Lawrence Berkeley National Laboratory, USA, and the University of Southampton, UK, attracting many scientists to each event,” comments Mike Smyth, EMEA business manager, OIPT. “We’ve chosen Grenoble as our next venue as it is a hub for innovation in France,” he adds. 

There is no charge for the workshop, but advance booking is essential.

Tags: OIPT

Visit: www.oxford-instruments.com