21 April 2011

Aixtron CRIUS II qualified in Taiwan with LED maker Chi Mei

Deposition equipment maker Aixtron SE of Herzogenrath, Germany says that its latest Close Coupled Showerhead (CCS) metal-organic chemical vapor deposition (MOCVD) platform system, the CRIUS II, has been qualified for mass production within the Chi Mei Group, based in southern Taiwan, outperforming expectations as to process stability, uniformity, and throughput.

Chi Mei was the first customer in Taiwan to receive the new system. The 55x2”-wafer configuration CCS CRIUS II was installed and commissioned by the local AIXTRON service team at facilities near the Southern Taiwan Science Park. Since then the team has been working closely with the customer to expedite the qualification process.

A company representative remarked that it has been a seamless transition from the CRIUS to the CRIUS II due to the system’s straightforward process transfer capabilities — the unique CCS reactor chamber technology simply requires the application of area-scaling factors, says Aixtron. This qualified system will shortly be fully operational and should provide the shortest time-to-market for Chi Mei's family of high-brightness light-emitting diode (HB-LED) products.

Aixtron says that the CRIUS II can be tuned to the optimum performance and can further be converted from 2- to 4-, 6-inch or larger wafer size production, a key factor for gallium nitride (GaN) LED manufacturing. Since larger wafer sizes play a crucial role in reducing the manufacturing cost in LED production, the CRIUS II can increase HB-LED manufacturing productivity, says Aixtron. Compared to the CRIUS, the CRIUS II reactor capacity has been increased from 31x2-inch to 55x2-inch wafers. Alternatively, the CRIUS II reactor chamber can accommodate as many as 13x4-inch wafers.

See: Aixtron Company Profile

Tags: Aixtron MOCVD LEDs Chi Mei

Visit: www.aixtron.com

Join Semiconductor Today's LinkedIn networking and discussion group