News

10 February 2010

 

Ultratech launches lithography system for HB-LED manufacturing

Lithography and laser-processing system maker Ultratech Inc of San Jose, CA, USA has launched the Sapphire 100 lithography system for high-brightness light-emitting diode (HB-LED) manufacturing, designed to enable users to meet the growing demand for illumination products.  

Ultratech says that demand is being driven by strong growth in LED backlighting applications, with even greater potential from the implementation of energy-saving LED-based solid-state lighting.  

Illumination is expected to become the fastest-growing segment of the HB-LED market, growing at a compound annual growth rate (CAGR) of 36% from 2007 to 2012, according to market research firm Strategies Unlimited. Future growth in the LED lighting market is expected to come from a mix of sources, such as street and parking lights, and indoor residential and office applications. Potential annual energy cost savings are estimated to be $10–100bn per country. Building on this expectation, Ultratech says that it has designed the Sapphire 100 to provide competitive advantages for HB-LED manufacturing.

“Today, approximately 25% of electricity is used for lighting,” says Doug Anberg, VP of advanced stepper technology. “As energy conservation efforts continue to increase, we expect lighting products with HB-LED technology to be in high demand.”  

Ultratech says that the Sapphire 100 was specifically designed to meet the wide range of lithography needs for HB-LED manufacturing. Building on the cost and performance advantages of the firm’s 1500 platform, the Sapphire 100 offers the added advantage of Ultratech's patented Machine Vision System (MVS), which delivers alignment flexibility with significant advantages over standard alignment techniques, it is claimed. 

Currently in beta testing, the production-ready Sapphire 100 system will be available in second-half 2010.

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Visit: www.ultratech.com