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9 April 2010
France’s CNRS orders Obducat nanoimprint lithography system
Obducat AB of Malmö, Sweden, which supplies systems based on nano-imprint lithography (NIL) and electron-beam lithography, says that it has received an order for an NIL tool from France's Centre National de la Recherche Scientific (CNRS) in Grenoble.
The Eitre system will be installed in the Plateforme Technologique Amont (PTA) cleanroom inside CNRS’ MINATEC campus, which is claimed to be the largest innovation centre for micro- and nanotechnology in Europe.
Obducat says that the flexible and easy-to-use system will be used in the PTA to offer equipment for research in nanoelectronics, magnetism, spintronic and photonics at MINATEC. “The renowned research community at MINATEC will now have access to our NIL technology,” says Obducat’s CEO Lars Tilly.
Search: Obducat Lithography NIL
Visit: www.obducat.com
Visit: www.minatec.com
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