News

9 February 2009

 

LG orders four Veeco TurboDisc K465 GaN MOCVD systems

Veeco Instruments Inc of Plainview, NY, USA says that, in fourth-quarter 2008, LG group subsidiary LG Innotek Co Inc of Seoul, Korea ordered four further TurboDisc K465 gallium nitride (GaN) metal-organic chemical vapor deposition (MOCVD) systems for making high-brightness LEDs (HB-LEDs).

“Veeco’s MOCVD tools enable a smooth transition to larger wafer sizes, offering a longer capital life along with a proven advantage in productivity,” says Dr Steve (Tchanghun) Oh, VP in charge of LED technology at LG Innotek. “These were all major factors in our decision to add more Veeco MOCVD systems to our HB-LED production line,” he adds.

“We are pleased to be helping LG Innotek meet their production demands for HB-LEDs for TV backlighting applications,” says Bill Miller, senior VP, general manager of Veeco's MOCVD operations. “The K465 has been designed to help customers seamlessly transition to larger wafer sizes.”

Veeco claims that its TurboDisc K465 GaN MOCVD system is the only production-proven, fully automated MOCVD platform available on the market. The ‘K-Series’ MOCVD platform includes the K300 and K465 models, offering a modular, upgradeable path to a higher-throughput, larger-diameter reactor chamber and reduced cost of ownership, the firm adds.

See related item:

Veeco GaN MOCVD system accepted by Japanese HB-LED manufacturer

See: Veeco Company Profile

Search: Veeco LG Innotek TurboDisc K465 GaN MOCVD HB-LEDs

Visit: www.lginnotek.com

Visit: www.veeco.com