News

20 February 2009

 

CVD Equipment range extended to solar applications

CVD Equipment Corp of Ronkonkoma, NY, USA has expanded its product line of EasyTube chemical vapor deposition systems to focus on quality control and R&D for next-generation process development in solar applications.

The EasyTube platform provides a framework of solutions that can be quickly and cost-efficiently customized to a wide variety of thin-film process requirements needed to accelerate the commercialization of next-generation solar cell/modules and smart windows.

As well as being used for quality control of polysilicon precursors in solar cell manufacturing, the EasyTube research systems can be used for the deposition of other films, including amorphous silicon, Polysilicon, silicon nitride, high- or low-temperature silicon dioxide, silicon and silicon-germanium epitaxy, transparent conductive oxides (SnO2, ZnO, etc), sulfurization, selenization, rapid thermal annealing, POCl3 and other related diffusion-driven processes needed for next-generation silicon and copper indium gallium diselenide (CIGS) solar cell process optimization.

The EasyTube system can be equipped with a variety of options, including a load-lock, operation at high or low pressures, substrate rotation for deposition and composition uniformity, and rapid heating. The process gas handling system accommodates pyrophoric, flammable, corrosive, toxic, solid and liquid source materials. Optional gas-, liquid- or solid-source delivery and process gas exhaust treatment allow turn-key process solutions.

See related items:

CVD Equipment doubles orders in 2008 to $29m

Growth forecast for 2009 solar installations cut from 49% to 26%

Search: CVD Equipment CVD Thin-firm solar CIGS

Visit: www.cvdequipment.com