News

22 April 2009

 

Metryx receives follow-on order for Mentor OC23 mass metrology system

Metryx Ltd of Bristol, UK says it has shipped a second Mentor OC23 mass metrology system to a US-based GaAs manufacturer. The customer’s name was not disclosed.

According to Metryx, the system will be used in the volume production of bulk acoustic wave (BAW) devices, where it will measure both deposition and etch processes on product wafers.

"Once the machine is in the production line, manufacturers can truly evaluate the effectiveness of the technology. To date, 95 percent of our customers have placed follow-on orders. We see that as an indication of mass metrology’s increasing value in the volume production environment," said Dr Adrian Kiermasz, Metryx’s president and CEO.

Metryx’s non-destructive, in-line metrology can be used to monitor product wafers in volume production environments for dielectric and conducting materials in etch, deposition and CMP process applications. Capable of measuring in the microgram range, the in-line Mentor OC23 tool monitors the mass change of any wafer following a process step, to determine whether device manufacture process steps are operating consistently and in the expected manner. The mass change response for the process step is managed like other SPC parameters in the process flow.

See related item:

Metryx receives mass metrology production tool order from US GaAs manufacturer

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