Company Profile: LPE S.p.A.

LPE: a company with close links to the development of epitaxial technologies

The late 1960s and early 1970s were crucial times in the development of modern computer technologies. LPE was founded in Milan, Italy during this essential period and began designing and producing Epitaxial Reactors.

LPE’s initial output involved horizontal type reactors for 1.5-2’’ wafers. The wafers were subsequently increased to their current size of 8’’.

During the mid 1970s, the company began production of dual station barrel reactors with high frequency induction heating. These reactors were state-of-the-art products at the time and have been continually updated over the years. This process has resulted in the excellent reliability and productivity that has made LPE one of the world’s leading epitaxial technology companies.

 

Picture (right): LPE's PE 2061 S Batch reactor.

 

LPE attributes its outstanding success to the close working relationship which it has endeavored to develop with leader firms in the sector. This on-going collaboration has resulted in extraordinary progress in an area which underpins computing worldwide.

LPE currently offers two families of reactors with medium frequency heating: the first family consists of Barrel reactors including the PE 2061 S Batch reactor; the second family includes the PE 3061 reactor with automatic wafer loading.

Picture (left): PE 3061 reactor with automatic wafer loading.

The company's production strategy concentrates on reactors dedicated to severe applications such as Schottky, Power Transistor, PowerMos, Rectifier, very thick epi layers for IGBT devices grown in a single process; NPN, patterned wafers and others on arsenic doped substrates, CMOS, Buried Layers on Sb doped substrates and Mixed Technology.

These two reactors families are capable of covering the whole range of products mentioned above, including large wafers.

Our philosophy involves building up a partnership relationship with our customers to ensure that each one receives an efficient yet highly personalized service, this in turn leads to:

• long term co-operation on products;

• protection of investments over time;

• direct assistance and support;

• easily available spare parts even for machines which are no longer in production.

LPE has developed and qualified SiC epitaxial reactors: ACiS M8 and ACiS M10.

From R&D to mass production, both systems provided the state-of-the art uniformity and reproducibility of epitaxial layer properties. Associated with enhanced process ACiS M8 and ACiS M10 presents attractive epi’ cost  in phase with current and future demands.

For further details, contact:

LPE S.p.A.
Via Falzarego, 8
20021 Baranzate (Mi), Italy
Tel: +39 02 383 41 51
Fax: +39 02 383 06 118
http://www.lpe-epi.com